Diffraction analysis of digital micromirror device in maskless photolithography system

	Diffraction analysis of digital micromirror device in maskless photolithography system
	Xiong Z.; Liu H.; Tan X. Q.; Lu Z. W.; Li C. X.; Song L. W.; Wang Z.
	2014
发表期刊	Journal of Micro-Nanolithography Mems and Moems
ISSN	ISBN/1932-5150
卷号	13 期号:4 页码:8
摘要	A digital micromirror device (DMD) acts as a spatial light modulator in a maskless photolithography system. Illuminated by coherent light, DMD performs as a two-dimensional diffraction grating because of its periodical internal structure. Diffraction efficiency is an important factor for evaluating the exposure doses. A diffraction model of DMD based on Fourier analysis demonstrates that errors of the DMD's manufacture and the precision of the machining of the optical mechanical structure affect the diffraction efficiency. Additionally, analysis of exposure results by the diffraction model of DMD in Tracepro explains the degradation of the exposure quality and is helpful for calibrating the direction of optical focusing. (C) 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/43894
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Xiong Z.,Liu H.,Tan X. Q.,et al. Diffraction analysis of digital micromirror device in maskless photolithography system[J]. Journal of Micro-Nanolithography Mems and Moems,2014,13(4):8.
APA	Xiong Z..,Liu H..,Tan X. Q..,Lu Z. W..,Li C. X..,...&Wang Z..(2014).Diffraction analysis of digital micromirror device in maskless photolithography system.Journal of Micro-Nanolithography Mems and Moems,13(4),8.
MLA	Xiong Z.,et al."Diffraction analysis of digital micromirror device in maskless photolithography system".Journal of Micro-Nanolithography Mems and Moems 13.4(2014):8.

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