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Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography
Li H.; Yu W.; Zhang L.; Liu Z.; Brown K. E.; Abraham E.; Cargill S.; Tonry C.; Patel M. K.; Bailey C.; Desmulliez M. P. Y.
2013
发表期刊Rsc Advances
ISSNISBN/2046-2069
卷号3期号:29
摘要This article demonstrates, through finite element analysis, the possibility to manufacture sub-30 nm polymeric channels using electrostatic induced lithography. Channels with a width of 25 nm, a depth of 50 nm and an inter-channel wall of 28 nm can be obtained by this patterning process. The influence of operational parameters such as the filling factor, the aspect ratio of the master electrode, the applied voltage and the gap between the two electrodes and initial film thickness has been studied in detail to define the fabrication limits of this process in the case of periodic nanostructures. Conclusions for such nanostructures can be generalised to other shapes manufactured from polymers.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/40851
专题中科院长春光机所知识产出
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GB/T 7714
Li H.,Yu W.,Zhang L.,et al. Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography[J]. Rsc Advances,2013,3(29).
APA Li H..,Yu W..,Zhang L..,Liu Z..,Brown K. E..,...&Desmulliez M. P. Y..(2013).Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography.Rsc Advances,3(29).
MLA Li H.,et al."Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography".Rsc Advances 3.29(2013).
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