Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography

	Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography
	Li H.; Yu W.; Zhang L.; Liu Z.; Brown K. E.; Abraham E.; Cargill S.; Tonry C.; Patel M. K.; Bailey C.; Desmulliez M. P. Y.
	2013
发表期刊	Rsc Advances
ISSN	ISBN/2046-2069
卷号	3 期号:29
摘要	This article demonstrates, through finite element analysis, the possibility to manufacture sub-30 nm polymeric channels using electrostatic induced lithography. Channels with a width of 25 nm, a depth of 50 nm and an inter-channel wall of 28 nm can be obtained by this patterning process. The influence of operational parameters such as the filling factor, the aspect ratio of the master electrode, the applied voltage and the gap between the two electrodes and initial film thickness has been studied in detail to define the fabrication limits of this process in the case of periodic nanostructures. Conclusions for such nanostructures can be generalised to other shapes manufactured from polymers.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/40851
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Li H.,Yu W.,Zhang L.,et al. Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography[J]. Rsc Advances,2013,3(29).
APA	Li H..,Yu W..,Zhang L..,Liu Z..,Brown K. E..,...&Desmulliez M. P. Y..(2013).Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography.Rsc Advances,3(29).
MLA	Li H.,et al."Simulation and modelling of sub-30 nm polymeric channels fabricated by electrostatic induced lithography".Rsc Advances 3.29(2013).

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