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Laser induced damage threshold testing of DUV optical substrates
Deng W.; Jin C.
2013
发表期刊Chinese Optics Letters
ISSNISBN/16717694
卷号11期号:SUPPL.1
摘要Laser induced damage threshold (LIDT) testing is the effective methods to research the lifetime of optical elements. According to ISO 11254 standards, a LIDT testing system of ArF excimer laser is established. The laser beam size on the sample surface can be varied from 0.3 to 0.6 mm in diameter. The maximum laser energy density is larger than 4.5 J/cm2. Besides the Nomarski microscope, He-Ne scattering is used and demonstrated as an ef fective and reliable method for the on-line monitoring of laser damage. The uncertainty of LIDT results and the main effecting factors are analyzed. The laser induced damage of fused silica substrates with different absorptions and CaF2 substrates with different absorptions are investigated in 1-on-1 mode, respectively. The roles of absorption on the LIDT results of the two kind substrates are discussed. 2013 Chinese Optics Letters.
收录类别EI
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/40727
专题中科院长春光机所知识产出
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Deng W.,Jin C.. Laser induced damage threshold testing of DUV optical substrates[J]. Chinese Optics Letters,2013,11(SUPPL.1).
APA Deng W.,&Jin C..(2013).Laser induced damage threshold testing of DUV optical substrates.Chinese Optics Letters,11(SUPPL.1).
MLA Deng W.,et al."Laser induced damage threshold testing of DUV optical substrates".Chinese Optics Letters 11.SUPPL.1(2013).
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