Glass homogeneity effect on wavefront aberration in lithography projection lens

	Glass homogeneity effect on wavefront aberration in lithography projection lens
	Shang H.; Huang W.; Liu C.; Xu W.; Yang W.
	2013
发表期刊	Chinese Optics Letters
ISSN	ISBN/16717694
期号	11
摘要	Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking. 2013 Chinese Optics Letters.
收录类别	SCI ; EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/40679
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Shang H.,Huang W.,Liu C.,et al. Glass homogeneity effect on wavefront aberration in lithography projection lens[J]. Chinese Optics Letters,2013(11).
APA	Shang H.,Huang W.,Liu C.,Xu W.,&Yang W..(2013).Glass homogeneity effect on wavefront aberration in lithography projection lens.Chinese Optics Letters(11).
MLA	Shang H.,et al."Glass homogeneity effect on wavefront aberration in lithography projection lens".Chinese Optics Letters .11(2013).