Fabrication antireflection (AR) coatings for P-polarized 193 nm laser light at an incidence angle of 74

	Fabrication antireflection (AR) coatings for P-polarized 193 nm laser light at an incidence angle of 74
	Jin J.; Jin C.; Li C.; Chang Y.
	2013
发表期刊	Optics Communications
ISSN	ISBN/00304018
期号	298-299
摘要	The antireflection coatings for P-polarized light at large incidence angle (68-75) are widely used in the ArF excimer laser microlithography light source system and other optical surfaces (e.g., in lenses, prisms, etc.) to suppress undesirable reflections. So the AR coatings for P-polarized 193 nm laser beam at an incidence angle of 74 were designed and fabricated. The results showed that after coating, the residential reflection of the optical components reduced dramatically, which could greatly improve the output efficiency of the optical components in the DUV range. 2013 Elsevier B.V. All rights reserved.
收录类别	SCI ; EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/40660
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Jin J.,Jin C.,Li C.,et al. Fabrication antireflection (AR) coatings for P-polarized 193 nm laser light at an incidence angle of 74[J]. Optics Communications,2013(298-299).
APA	Jin J.,Jin C.,Li C.,&Chang Y..(2013).Fabrication antireflection (AR) coatings for P-polarized 193 nm laser light at an incidence angle of 74.Optics Communications(298-299).
MLA	Jin J.,et al."Fabrication antireflection (AR) coatings for P-polarized 193 nm laser light at an incidence angle of 74".Optics Communications .298-299(2013).

条目包含的文件		下载所有文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
Jin-2013-Fabrication（506KB）			开放获取	CC BY-NC-ND	浏览下载