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Effect of compressive stress on doping efficiency of nitrogen in ZnO films
Liu W. W.; Zhang Z. Z.; Yao B.; Shen D. Z.; Liu C. L.
2013
发表期刊Optical Materials
ISSNISBN/0925-3467
卷号35期号:12
摘要Nitrogen (N)-doped ZnO films (ZnO:N) grown on the a-/c-plane sapphire substrates (a-/c-Al2O3) by plasma-assisted molecular beam epitaxy were investigated. It was found that the content of N in the ZnO films grown on c-Al2O3 is higher than that of the films grown on a-Al2O3. The ZnO:N films grown on c-Al2O3 have lower carrier concentration and larger intensity ratio of the DAP/D degrees X emission compared with those of the ZnO:N films grown on a-Al2O3 under the same growth conditions, which indicates higher incorporation efficiency of N in the ZnO films grown on c-Al2O3. (C) 2013 Elsevier B.V. All rights reserved.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/40623
专题中科院长春光机所知识产出
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Liu W. W.,Zhang Z. Z.,Yao B.,et al. Effect of compressive stress on doping efficiency of nitrogen in ZnO films[J]. Optical Materials,2013,35(12).
APA Liu W. W.,Zhang Z. Z.,Yao B.,Shen D. Z.,&Liu C. L..(2013).Effect of compressive stress on doping efficiency of nitrogen in ZnO films.Optical Materials,35(12).
MLA Liu W. W.,et al."Effect of compressive stress on doping efficiency of nitrogen in ZnO films".Optical Materials 35.12(2013).
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