Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Substrate-removed semiconductor disk laser with 0.6 W output power | |
Zhang P.; Dai T.; Wu Y.; Ni Y.; Zhou Y.; Qin L.; Liang Y.; Fan S. | |
2012 | |
发表期刊 | Chinese Optics Letters |
ISSN | 16717694 |
卷号 | 10期号:SUPPL.1 |
摘要 | A high power and good beam quality InGaAs/GaAs quantum well semiconductor disk laser at 1015 nm wavelength is reported. The semiconductor wafer is grown in reverse order: substrate is on the window side and the distributed Bragg reflector is the last grown epilayer. Then the wafer is up-side-down and capillary bonded to a SiC heatsink, and the substrate is chemically etched. Because the total thickness of the substrate-removed structure is less than 10 m, the thermal management of the laser is significantly improved, and the maximum output power over 0.6 W is obtained using a 3% output coupler and 3.2 W incident pump power. The M2 factors of 1.02 and 1.01 indicate a near-diffraction-limited beam quality. To further reveal the characteristics of this substrate-etched structure on the thermal management, the heat flux and the temperature distribution of the gain wafer are numerically analyzed, and the corresponding results are discussed. 2012 Chinese Optics Letter. |
收录类别 | EI |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/34572 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Zhang P.,Dai T.,Wu Y.,et al. Substrate-removed semiconductor disk laser with 0.6 W output power[J]. Chinese Optics Letters,2012,10(SUPPL.1). |
APA | Zhang P..,Dai T..,Wu Y..,Ni Y..,Zhou Y..,...&Fan S..(2012).Substrate-removed semiconductor disk laser with 0.6 W output power.Chinese Optics Letters,10(SUPPL.1). |
MLA | Zhang P.,et al."Substrate-removed semiconductor disk laser with 0.6 W output power".Chinese Optics Letters 10.SUPPL.1(2012). |
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