Oxygen diffusion through Al-doped amorphous SiO2

	Oxygen diffusion through Al-doped amorphous SiO2
	Wang Y. G.; Sohn Y. H.; Fan Y.; Zhang L. G.; An L. N.
	2006
发表期刊	Journal of Phase Equilibria and Diffusion
ISSN	1547-7037
卷号	27 期号:6 页码:671-675
摘要	Oxygen (O) diffusion through pure and aluminum (Al)-doped amorphous silica is investigated by,using secondary ion mass spectrometry to profile the diffusion of an O-18 tracer. The oxides are formed by the thermal oxidation of polymer-derived SiCN and SiAlCN ceramics. The authors demonstrate that a small amount of Al dopant can significantly inhibit both the interstitial and network diffusion of O. The activation energy of O network diffusion for Al-doped silica is two times higher than that for pure silica. The results are discussed in terms of the modification of Al doping on the network structure of the otherwise pure silica.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/34379
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang Y. G.,Sohn Y. H.,Fan Y.,et al. Oxygen diffusion through Al-doped amorphous SiO2[J]. Journal of Phase Equilibria and Diffusion,2006,27(6):671-675.
APA	Wang Y. G.,Sohn Y. H.,Fan Y.,Zhang L. G.,&An L. N..(2006).Oxygen diffusion through Al-doped amorphous SiO2.Journal of Phase Equilibria and Diffusion,27(6),671-675.
MLA	Wang Y. G.,et al."Oxygen diffusion through Al-doped amorphous SiO2".Journal of Phase Equilibria and Diffusion 27.6(2006):671-675.