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Fabrication of Nitrogen Doped p-ZnO and ZnO Light-Emitting Diodes on Sapphire
Wei Z. P.; Lu Y. M.; Shen D. Z.; Zhang Z. Z.; Yao B.; Li B. H.; Zhang J. Y.; Zhao D. X.; Fan X. W.; Tang Z. K.
2008
发表期刊Journal of the Korean Physical Society
ISSN0374-4884
卷号53期号:5页码:3038-3042
摘要Nitrogen-doped p-type ZnO thin films were grown on c-plane sapphire (Al2O3) substrates by plasma-assistant molecular beam epitaxy, where O-2 and N-2 were introduced via a RF plasma source simultaneously. In situ optical emission spectra of the plasma were employed to monitor the chemical species in the active gas sources, one of the most important growth parameters. By adjusting the growth parameters, we confirm the optimal condition for p-type doping growth. The reproducible p-type ZnO thin films have the hole concentration (N-A - N-D) up to 1.0 x 10(18) cm(-3) and the resistivity of 6 Omega cm. A ZnO LED was fabricated by depositing undoped n-type ZnO on the p-type layer. Electroluminescence spectra centered about 430 nm were obtained even at 350 K.
收录类别SCI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/34372
专题中科院长春光机所知识产出
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Wei Z. P.,Lu Y. M.,Shen D. Z.,et al. Fabrication of Nitrogen Doped p-ZnO and ZnO Light-Emitting Diodes on Sapphire[J]. Journal of the Korean Physical Society,2008,53(5):3038-3042.
APA Wei Z. P..,Lu Y. M..,Shen D. Z..,Zhang Z. Z..,Yao B..,...&Tang Z. K..(2008).Fabrication of Nitrogen Doped p-ZnO and ZnO Light-Emitting Diodes on Sapphire.Journal of the Korean Physical Society,53(5),3038-3042.
MLA Wei Z. P.,et al."Fabrication of Nitrogen Doped p-ZnO and ZnO Light-Emitting Diodes on Sapphire".Journal of the Korean Physical Society 53.5(2008):3038-3042.
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