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Optimization design and manufacturing tolerance analysis of a polymer microring resonant wavelength multiplexer
其他题名论文其他题名
Ma C. S.; Wang X. Y.; E S. L.; Xu Y. Z.; Yan X.; Zhang D. M.; Cui Z. C.; Sun D. G.
2005
发表期刊Optical Engineering
ISSN0091-3286
卷号44期号:2
摘要Based on formulas presented, optimization design is performed and the effects of manufacturing tolerances on transmission characteristics are analyzed for a polymer microring resonant wavelength multiplexer around the central wavelength of 1.550918 mu m with wavelength spacing 1.6 nm. Modeling results show that the insertion loss is less than 0.55 dB and crosstalk is less than -21 dB for each of eight vertical output channels of the designed device without tolerances. Some manufacturing tolerances result in a shift of the transmission spectrum and lead to increases of the inserted loss and crosstalk over the design case without tolerances. (c) 2005 Society of Photo-Optical Instrumentation Engineers.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26813
专题中科院长春光机所知识产出
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GB/T 7714
Ma C. S.,Wang X. Y.,E S. L.,et al. Optimization design and manufacturing tolerance analysis of a polymer microring resonant wavelength multiplexer[J]. Optical Engineering,2005,44(2).
APA Ma C. S..,Wang X. Y..,E S. L..,Xu Y. Z..,Yan X..,...&Sun D. G..(2005).Optimization design and manufacturing tolerance analysis of a polymer microring resonant wavelength multiplexer.Optical Engineering,44(2).
MLA Ma C. S.,et al."Optimization design and manufacturing tolerance analysis of a polymer microring resonant wavelength multiplexer".Optical Engineering 44.2(2005).
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