Mathematical model of spin-coated photoresist on a spherical substrate

	Mathematical model of spin-coated photoresist on a spherical substrate
其他题名	论文其他题名
	Feng X. G.; Sun L. C.
	2005
发表期刊	Optics Express
ISSN	1094-4087
卷号	13 期号:18 页码:7070-7075
摘要	We present the final film thickness' expression of spin-coated photoresist on a spherical substrate. Firstly, some reasonable assumptions are put forward for a concise derivation process. Then, on the basis of the motion equation of spin-coated photoresist on a plane, considering the spherical surface shape, we put forward the motion equation of spin-coated photoresist on a spherical substrate. So two evolution equations of film thickness and radial position are derived, and the expression of initial film thickness evolution in a radial position is also gained. Finally, considering some effects of solvent volatilization, we gain the expression of final film thickness. The experiment result indicates that the expression is accurate. (c) 2005 Optical Society of America.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/26764
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Feng X. G.,Sun L. C.. Mathematical model of spin-coated photoresist on a spherical substrate[J]. Optics Express,2005,13(18):7070-7075.
APA	Feng X. G.,&Sun L. C..(2005).Mathematical model of spin-coated photoresist on a spherical substrate.Optics Express,13(18),7070-7075.
MLA	Feng X. G.,et al."Mathematical model of spin-coated photoresist on a spherical substrate".Optics Express 13.18(2005):7070-7075.

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