Changchun Institute of Optics,Fine Mechanics and Physics,CAS
The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition | |
其他题名 | 论文其他题名 |
Zhang Z. Z.; Shen D. Z.; Zhang J. Y.; Shan C. X.; Lu Y. M.; Liu Y. C.; Li B. H.; Zhao D. X.; Yao B.; Fan X. W. | |
2006 | |
发表期刊 | Thin Solid Films |
ISSN | 0040-6090 |
卷号 | 513期号:1—2页码:114-117 |
摘要 | In this work, ZnS thin films with single-phase zinc blende structure were fabricated on silica glass substrates by plasma-assisted metalorganic chemical vapor deposition (PA-MOCVD). Dimethyl zinc and hydrogen sulfide were used as the precursors. The films were characterized using X-ray diffraction and photoluminescence spectroscopy. The optimal temperature for ZnS growth, 350 degrees C, was confirmed via a series of growth at different temperatures. In order to obtain stoichiometric ZnS films using PA-MOCVD, larger VI/II gas flow ratios was needed than the one used without plasma assistance. The reason for this phenomenon is discussed. (c) 2006 Elsevier B.V. All rights reserved. |
收录类别 | SCI ; EI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/26717 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Zhang Z. Z.,Shen D. Z.,Zhang J. Y.,et al. The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition[J]. Thin Solid Films,2006,513(1—2):114-117. |
APA | Zhang Z. Z..,Shen D. Z..,Zhang J. Y..,Shan C. X..,Lu Y. M..,...&Fan X. W..(2006).The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition.Thin Solid Films,513(1—2),114-117. |
MLA | Zhang Z. Z.,et al."The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition".Thin Solid Films 513.1—2(2006):114-117. |
条目包含的文件 | 下载所有文件 | |||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
Zhang-2006-The growt(231KB) | 开放获取 | -- | 浏览 下载 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论