The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition

	The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition
其他题名	论文其他题名
	Zhang Z. Z.; Shen D. Z.; Zhang J. Y.; Shan C. X.; Lu Y. M.; Liu Y. C.; Li B. H.; Zhao D. X.; Yao B.; Fan X. W.
	2006
发表期刊	Thin Solid Films
ISSN	0040-6090
卷号	513 期号:1—2 页码:114-117
摘要	In this work, ZnS thin films with single-phase zinc blende structure were fabricated on silica glass substrates by plasma-assisted metalorganic chemical vapor deposition (PA-MOCVD). Dimethyl zinc and hydrogen sulfide were used as the precursors. The films were characterized using X-ray diffraction and photoluminescence spectroscopy. The optimal temperature for ZnS growth, 350 degrees C, was confirmed via a series of growth at different temperatures. In order to obtain stoichiometric ZnS films using PA-MOCVD, larger VI/II gas flow ratios was needed than the one used without plasma assistance. The reason for this phenomenon is discussed. (c) 2006 Elsevier B.V. All rights reserved.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/26717
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Zhang Z. Z.,Shen D. Z.,Zhang J. Y.,et al. The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition[J]. Thin Solid Films,2006,513(1—2):114-117.
APA	Zhang Z. Z..,Shen D. Z..,Zhang J. Y..,Shan C. X..,Lu Y. M..,...&Fan X. W..(2006).The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition.Thin Solid Films,513(1—2),114-117.
MLA	Zhang Z. Z.,et al."The growth of single cubic phase ZnS thin films on silica glass by plasma-assisted metalorganic chemical vapor deposition".Thin Solid Films 513.1—2(2006):114-117.

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