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Convex corners undercutting and rhombus compensation in KOH with and without IPA solution on (110) silicon
其他题名论文其他题名
Jia C. P.; Dong W.; Liu C. X.; Zhang X. D.; Zhou J. R.; Zhong Z. C.; Xue H. L.; Zang H. D.; Xu B. K.; Chen W. Y.
2006
发表期刊Microelectronics Journal
ISSN0026-2692
卷号37期号:11页码:1297-1301
摘要The present investigation introduces convex corners undercutting and results of rhombus compensation patterns in 40% aqueous KOH solution and in KOH saturated with isopropanol (IPA) solution. All experiments are carried out on (110) silicon at 70 degrees C. Undercuts take place on convex corners in both solutions. Moreover, the front etch planes governing undercut vary with solutions. Rhombus compensations are used to correct the undercut. Perfect acute corner without residue is obtained, and there are only some residue structures on both sides of obtuse convex corners in KOH with IPA solution, which are better results than those in pure aqueous KOH solution. (c) 2006 Elsevier Ltd. All rights reserved.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26689
专题中科院长春光机所知识产出
推荐引用方式
GB/T 7714
Jia C. P.,Dong W.,Liu C. X.,et al. Convex corners undercutting and rhombus compensation in KOH with and without IPA solution on (110) silicon[J]. Microelectronics Journal,2006,37(11):1297-1301.
APA Jia C. P..,Dong W..,Liu C. X..,Zhang X. D..,Zhou J. R..,...&Chen W. Y..(2006).Convex corners undercutting and rhombus compensation in KOH with and without IPA solution on (110) silicon.Microelectronics Journal,37(11),1297-1301.
MLA Jia C. P.,et al."Convex corners undercutting and rhombus compensation in KOH with and without IPA solution on (110) silicon".Microelectronics Journal 37.11(2006):1297-1301.
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