Optical property of hexagonal nanocrystalline zno film on Si substrate prepared by plasma-enhanced CVD

	Optical property of hexagonal nanocrystalline zno film on Si substrate prepared by plasma-enhanced CVD
其他题名	论文其他题名
	Xiao Z. Y.; Liu Y. C.; Zhao D. X.; Zhang J. Y.; Lu Y. M.; Shen D. Z.; Fan X. W.
	2007
发表期刊	Journal of Luminescence
ISSN	0022-2313
卷号	122 页码:822-824
摘要	In this paper, a two-step low-temperature growth method is reported for the fabrication of ZnO film. Hexagonal nanocrystalline ZnO film has been grown on a Si(1 0 0) substrate by plasma-enhanced chemical vapor deposition (PECVD) at a comparatively low temperature of 150 degrees C. The X-ray pattern shows that the film has a c-axis preferential orientation in the (0 0 0 2) crystal direction. SEM image indicates the film with a thickness of 300 run consists of nanocrystallites with hexagonal cross-section, and the diameters of the nanocrystallites range from 100 to 120nm. Room temperature photoluminescence (PL) spectrum exhibits a strong ultraviolet emission and the defect-related emission is negligibly weak. Possible reasons for low-temperature growth of high-quality Si-based ZnO film are discussed. (c) 2006 Elsevier B.V. All rights reserved.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/26609
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Xiao Z. Y.,Liu Y. C.,Zhao D. X.,et al. Optical property of hexagonal nanocrystalline zno film on Si substrate prepared by plasma-enhanced CVD[J]. Journal of Luminescence,2007,122:822-824.
APA	Xiao Z. Y..,Liu Y. C..,Zhao D. X..,Zhang J. Y..,Lu Y. M..,...&Fan X. W..(2007).Optical property of hexagonal nanocrystalline zno film on Si substrate prepared by plasma-enhanced CVD.Journal of Luminescence,122,822-824.
MLA	Xiao Z. Y.,et al."Optical property of hexagonal nanocrystalline zno film on Si substrate prepared by plasma-enhanced CVD".Journal of Luminescence 122(2007):822-824.

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