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Ultraviolet photoconductive detector with high visible rejection and fast photoresponse based on ZnO thin film
其他题名论文其他题名
Liu K. W.; Ma J. G.; Zhang J. Y.; Lu Y. M.; Jiang D. Y.; Li B. H.; Zhao D. X.; Zhang Z. Z.; Yao B.; Shen D. Z.
2007
发表期刊Solid-State Electronics
ISSN0038-1101
卷号51期号:5页码:757-761
摘要In this study, metal-semiconductor-metal (NISM) photoconductive detector was fabricated on c-axis preferred oriented ZnO film prepared on quartz by radio frequency magnetron sputtering. With the applied bias below 3 V, the dark current was below 250 nA. The typical responsivity peaked at around 360 nm, and had values of 30 A/W. In addition, the UV (360 nm) to visible (450 nm) rejection ratio of around five orders could be extracted from the spectra response. Furthermore, the transient response measurement revealed fast photoresponse with a rise time of 20 ns. (c) 2007 Elsevier Ltd. All rights reserved.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26604
专题中科院长春光机所知识产出
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Liu K. W.,Ma J. G.,Zhang J. Y.,et al. Ultraviolet photoconductive detector with high visible rejection and fast photoresponse based on ZnO thin film[J]. Solid-State Electronics,2007,51(5):757-761.
APA Liu K. W..,Ma J. G..,Zhang J. Y..,Lu Y. M..,Jiang D. Y..,...&Shen D. Z..(2007).Ultraviolet photoconductive detector with high visible rejection and fast photoresponse based on ZnO thin film.Solid-State Electronics,51(5),757-761.
MLA Liu K. W.,et al."Ultraviolet photoconductive detector with high visible rejection and fast photoresponse based on ZnO thin film".Solid-State Electronics 51.5(2007):757-761.
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