Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Synthesis and characterization of diamond microcrystals and nanorods deposited by hot cathode direct current plasma chemical vapor deposition method | |
其他题名 | 论文其他题名 |
Zeng L. Y.; Peng H. Y.; Wang W. B.; Chen Y. Q.; Lei D.; Qi W. T.; Liang J. Q.; Zhao J. L.; Kong X. G.; Zhang H. | |
2008 | |
发表期刊 | Journal of Physical Chemistry C |
ISSN | 1932-7447 |
卷号 | 112期号:15页码:6160-6164 |
摘要 | (111) diamond microcrystals and (100) diamond microcrystals and nanorods were synthesized on Si substrate by hot cathode direct current plasma chemical vapor deposition method. The morphology, structure, and optical properties of the diamond films were characterized by scanning electron microscopy, X-ray diffraction, Raman spectra, and Fourier transform infrared spectra. The results showed that (111) and (100) diamond films can be grown under the condition of high-temperature (1223 K), low CH4 concentration (4/300 sccm) and low temperature (1098 K), high CH4 concentration (6/300 sccm), respectively. The (100) diamond film has lower purity and quality but higher optical transmittance than the (111) diamond film. Thus, the reactor temperature and CH4 concentration are responsible for the growth of diamond films. |
收录类别 | SCI ; EI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/26517 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Zeng L. Y.,Peng H. Y.,Wang W. B.,et al. Synthesis and characterization of diamond microcrystals and nanorods deposited by hot cathode direct current plasma chemical vapor deposition method[J]. Journal of Physical Chemistry C,2008,112(15):6160-6164. |
APA | Zeng L. Y..,Peng H. Y..,Wang W. B..,Chen Y. Q..,Lei D..,...&Zhang H..(2008).Synthesis and characterization of diamond microcrystals and nanorods deposited by hot cathode direct current plasma chemical vapor deposition method.Journal of Physical Chemistry C,112(15),6160-6164. |
MLA | Zeng L. Y.,et al."Synthesis and characterization of diamond microcrystals and nanorods deposited by hot cathode direct current plasma chemical vapor deposition method".Journal of Physical Chemistry C 112.15(2008):6160-6164. |
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