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Optical and electrical properties of p-type ZnO fabricated by NH3 plasma post-treated ZnO thin films
其他题名论文其他题名
Cao P.; Zhao D. X.; Zhang J. Y.; Shen D. Z.; Lu Y. M.; Yao B.; Li B. H.; Bai Y.; Fan X. W.
2008
发表期刊Applied Surface Science
ISSN0169-4332
卷号254期号:9页码:2900-2904
摘要In this paper, a simple method is reported to obtain nitrogen-doped p-ZnO film. In this method NH3 plasma, generated in a plasma-enhanced chemical vapor deposition system, was employed to treat ZnO thin film. By Hall-effect measurement, a p-type conductivity was observed for the treated film with the hole density of 2.2 x 10(16) cm(-3). X- ray photoelectron spectroscopy (XPS) results confirmed that nitrogen was incorporated into ZnO film during the treatment process to occupy the oxygen positions. In low temperature photoluminescence spectra, an emission peak corresponding to acceptor - donor pair was observed. From this emission peak we calculated the N-related acceptor binding energy to be 130 meV. (c) 2007 Elsevier B. V. All rights reserved.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26458
专题中科院长春光机所知识产出
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GB/T 7714
Cao P.,Zhao D. X.,Zhang J. Y.,et al. Optical and electrical properties of p-type ZnO fabricated by NH3 plasma post-treated ZnO thin films[J]. Applied Surface Science,2008,254(9):2900-2904.
APA Cao P..,Zhao D. X..,Zhang J. Y..,Shen D. Z..,Lu Y. M..,...&Fan X. W..(2008).Optical and electrical properties of p-type ZnO fabricated by NH3 plasma post-treated ZnO thin films.Applied Surface Science,254(9),2900-2904.
MLA Cao P.,et al."Optical and electrical properties of p-type ZnO fabricated by NH3 plasma post-treated ZnO thin films".Applied Surface Science 254.9(2008):2900-2904.
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