Fabrication and magnetization measurement of Ni thin films on silicon substrate by electrodeposition

	Fabrication and magnetization measurement of Ni thin films on silicon substrate by electrodeposition
其他题名	论文其他题名
	Tang Y.; Zhao D. X.; Shen D. Z.; Zhang J. Y.; Li B. H.; Lu Y. M.; Fan X. W.
	2008
发表期刊	Thin Solid Films
ISSN	0040-6090
卷号	516 期号:8 页码:2094-2098
摘要	Ni thin films were electrodeposited on n-Si (100) substrate from the electrolytes containing Ni(CH3COO)(2) and CH3COONH4 at room temperature. The scanning electron microscope images of the films reveals the uniform distribution of the nickel all over the substrate surface, which illustrates that the fine Ni films on large scales could be obtained through the method of electrodeposition. Vibrating sample magnetometer measurement with the applied field parallel to the surface shows obvious hysteresis loops of the magnetic thin films. The morphology and magnetism of the Ni thin films evolves with the deposition time increasing. The effect of deposition conditions on the properties of the Ni thin films is investigated. (c) 2007 Elsevier B.V. All rights reserved.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/26433
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Tang Y.,Zhao D. X.,Shen D. Z.,et al. Fabrication and magnetization measurement of Ni thin films on silicon substrate by electrodeposition[J]. Thin Solid Films,2008,516(8):2094-2098.
APA	Tang Y..,Zhao D. X..,Shen D. Z..,Zhang J. Y..,Li B. H..,...&Fan X. W..(2008).Fabrication and magnetization measurement of Ni thin films on silicon substrate by electrodeposition.Thin Solid Films,516(8),2094-2098.
MLA	Tang Y.,et al."Fabrication and magnetization measurement of Ni thin films on silicon substrate by electrodeposition".Thin Solid Films 516.8(2008):2094-2098.

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