Study for dual-function EUV multilayer mirror

	Study for dual-function EUV multilayer mirror
其他题名	论文其他题名
	Wang L. H.; Wang X. K.; Chen B.
	2008
发表期刊	Optics and Laser Technology
ISSN	0030-3992
卷号	40 期号:3 页码:571-574
摘要	Studying the distribution of He+ in Earth's plasmasphere by detecting its resonantly scattered emission at 304 angstrom will record the structure and dynamics of the cold plasma in Earth's plasmasphere on a global scale. EUV imaging systems usually utilizes near-normal incidence optics including multilayer mirror and filter. In this paper, the space condition of the Earth's plasmasphere to confirm the expected performance of mirror were analyzed. In order to achieve higher response at 304 angstrom and reduce 584 angstrom radiation for the optical system, a new multilayer coating of Mo/Si with UO2 was developed. Based on optical constants of Mo, Si and UO2, we used a simplest method to compute the reflectance of this new multilayer mirror range from 100 to 584 angstrom. The results show the desirable thickness of UO2 is 17 angstrom, and the multilayer mirror has a high reflectance of 26.10% at 304 angstrom and a low reflectance of 0.52% at 584 angstrom (C) 2007 Elsevier Ltd. All rights reserved.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/26419
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang L. H.,Wang X. K.,Chen B.. Study for dual-function EUV multilayer mirror[J]. Optics and Laser Technology,2008,40(3):571-574.
APA	Wang L. H.,Wang X. K.,&Chen B..(2008).Study for dual-function EUV multilayer mirror.Optics and Laser Technology,40(3),571-574.
MLA	Wang L. H.,et al."Study for dual-function EUV multilayer mirror".Optics and Laser Technology 40.3(2008):571-574.

条目包含的文件		下载所有文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
Wang-2008-Study for （230KB）			开放获取	--	浏览下载