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Ultraviolet Photodetector Based on a MgZnO Film Grown by Radio-Frequency Magnetron Sputtering
其他题名论文其他题名
Zhao Y. M.; Zhang J. Y.; Jiang D. Y.; Shan C. X.; Zhang Z. Z.; Yao B.; Zhao D. X.; Shen D. Z.
2009
发表期刊Acs Applied Materials & Interfaces
ISSN1944-8244
卷号1期号:11页码:2428-2430
摘要The metal-semiconductor-metal ultraviolet (UV) photodetector was fabricated on the Mg(0.47)Zn(0.53)O layer grown by radio-frequency magnetron cosputtering. The photodetector shows the peak response at 290 nm with a cutoff wavelength at 312 nm. It exhibits a very low dark current of about 3 pA at 5 V bias, and the UV-visible rejection ratio (R = 290 nm/R = 400 nm) is more than 4 orders of magnitude. The transient response for the detector was measured, and it was Found that the rise time is 10 ns and the fall time is 30 ns. The reason for the short response time is related to the Schottky structure.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26269
专题中科院长春光机所知识产出
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Zhao Y. M.,Zhang J. Y.,Jiang D. Y.,et al. Ultraviolet Photodetector Based on a MgZnO Film Grown by Radio-Frequency Magnetron Sputtering[J]. Acs Applied Materials & Interfaces,2009,1(11):2428-2430.
APA Zhao Y. M..,Zhang J. Y..,Jiang D. Y..,Shan C. X..,Zhang Z. Z..,...&Shen D. Z..(2009).Ultraviolet Photodetector Based on a MgZnO Film Grown by Radio-Frequency Magnetron Sputtering.Acs Applied Materials & Interfaces,1(11),2428-2430.
MLA Zhao Y. M.,et al."Ultraviolet Photodetector Based on a MgZnO Film Grown by Radio-Frequency Magnetron Sputtering".Acs Applied Materials & Interfaces 1.11(2009):2428-2430.
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