Uniformity study of nickel thin-film microstructure deposited by electroplating

	Uniformity study of nickel thin-film microstructure deposited by electroplating
其他题名	论文其他题名
	Li J. D.; Zhang P.; Wu Y. H.; Liu Y. S.; Xuan M.
	2009
发表期刊	Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems
ISSN	0946-7076
卷号	15 期号:4 页码:505-510
摘要	The thickness uniformity and the cross-sectional profiles of electroplated individual nickel microstructures were investigated in given electroplating conditions. The main factors influencing the thickness uniformity of microstructures were discussed. An effective method to overcome the burning problem by increasing the sacrifice seed layer structure is proposed. It is shown that the thickness uniformity and the cross-sectional profiles of the microstructures can be controlled by changing the process conditions. The current crowding observed in patterned specimens is responsible for the saddle shape profile of individual microstructures, while the combination of the current crowding and the cathodic polarizability are believed to be responsible for the abnormal cap-like profile of individual microstructures. A uniform thickness distribution and microstructures with flat profiles were obtained at optimal plating conditions of 8.05 mA/cm(2) and 20A degrees C.
收录类别	SCI ; EI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/26260
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Li J. D.,Zhang P.,Wu Y. H.,et al. Uniformity study of nickel thin-film microstructure deposited by electroplating[J]. Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems,2009,15(4):505-510.
APA	Li J. D.,Zhang P.,Wu Y. H.,Liu Y. S.,&Xuan M..(2009).Uniformity study of nickel thin-film microstructure deposited by electroplating.Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems,15(4),505-510.
MLA	Li J. D.,et al."Uniformity study of nickel thin-film microstructure deposited by electroplating".Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems 15.4(2009):505-510.

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