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Design and comparison of GaAs, GaAsP and InGaAlAs quantum-well active regions for 808-nm VCSELs
其他题名论文其他题名
Zhang Y.; Ning Y. Q.; Zhang L. S.; Zhang J. S.; Zhang J. W.; Wang Z. F.; Zhang J.; Zeng Y. G.; Wang L. J.
2011
发表期刊Optics Express
ISSN1094-4087
卷号19期号:13页码:12569-12581
摘要Vertical-cavity surface-emitting lasers emitting at 808 nm with unstrained GaAs/Al0.3Ga0.7As, tensilely strained GaAsxP1-x/Al0.3Ga0.7As and compressively strained In1-x-yGaxAlyAs/Al0.3Ga0.7As quantum-well active regions have been investigated. A comprehensive model is presented to determine the composition and width of these quantum wells. The numerical simulation shows that the gain peak wavelength is near 800 nm at room temperature for GaAs well with width of 4 nm, GaAs0.87P0.13 well with width of 13 nm and In0.14Ga0.74Al0.12As well with width of 6 nm. Furthermore, the output characteristics of the three designed quantum-well VCSELs are studied and compared. The results indicate that In0.14Ga0.74Al0.12As is the most appropriate candidate for the quantum well of 808-nm VCSELs. (C)2011 Optical Society of America
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26046
专题中科院长春光机所知识产出
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Zhang Y.,Ning Y. Q.,Zhang L. S.,et al. Design and comparison of GaAs, GaAsP and InGaAlAs quantum-well active regions for 808-nm VCSELs[J]. Optics Express,2011,19(13):12569-12581.
APA Zhang Y..,Ning Y. Q..,Zhang L. S..,Zhang J. S..,Zhang J. W..,...&Wang L. J..(2011).Design and comparison of GaAs, GaAsP and InGaAlAs quantum-well active regions for 808-nm VCSELs.Optics Express,19(13),12569-12581.
MLA Zhang Y.,et al."Design and comparison of GaAs, GaAsP and InGaAlAs quantum-well active regions for 808-nm VCSELs".Optics Express 19.13(2011):12569-12581.
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