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The activation energy of the nitrogen acceptor in p-type ZnO film grown by plasma-assisted molecular beam epitaxy
其他题名论文其他题名
Sun J. W.; Lu Y. M.; Liu Y. C.; Shen D. Z.; Zhang Z. Z.; Li B. H.; Zhang J. Y.; Yao B.; Zhao D. X.; Fan X. W.
2006
发表期刊Solid State Communications
ISSN0038-1098
卷号140期号:7—8页码:345-348
摘要The nitrogen-doped, p-type ZnO film was grown by plasma-assisted molecular beam epitaxy (P-MBE) on c-plane sapphire (c-Al2O3) using radical NO as oxygen and nitrogen sources. The activation energy of the nitrogen acceptor (AENA) was obtained by the temperature-dependent Hall effect and photoluminescence (PL) measurements, respectively. However, the values of AENA were rather different for the two methods, i.e., 75 meV for the Hall effect measurement and 145 meV for the photoluminescence measurement. In terms of the electrostatic interaction model, this energy difference was explained by the relationship between the Hall activation energy and the optical activation energy. According to these analyses, the reasonable value of the acceptor activation energy in nitrogen-doped p-type ZnO can be determined either by Hall experiments or by optical methods. (c) 2006 Elsevier Ltd. All rights reserved.
收录类别SCI ; EI
语种英语
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/26010
专题中科院长春光机所知识产出
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Sun J. W.,Lu Y. M.,Liu Y. C.,et al. The activation energy of the nitrogen acceptor in p-type ZnO film grown by plasma-assisted molecular beam epitaxy[J]. Solid State Communications,2006,140(7—8):345-348.
APA Sun J. W..,Lu Y. M..,Liu Y. C..,Shen D. Z..,Zhang Z. Z..,...&Fan X. W..(2006).The activation energy of the nitrogen acceptor in p-type ZnO film grown by plasma-assisted molecular beam epitaxy.Solid State Communications,140(7—8),345-348.
MLA Sun J. W.,et al."The activation energy of the nitrogen acceptor in p-type ZnO film grown by plasma-assisted molecular beam epitaxy".Solid State Communications 140.7—8(2006):345-348.
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