Fabrication of patterned polymer resists for ion etching by using dewetting

	Fabrication of patterned polymer resists for ion etching by using dewetting
其他题名	论文其他题名
	Lu G.; Cao Z. L.; Lu Z. W.; Li W.; Yao J. M.; Zhang G.; Yang B.; Shen J. C.
	2002
发表期刊	Chemical Journal of Chinese Universities-Chinese
ISSN	0251-0790
卷号	23 期号:12 页码:2390-2392
摘要	A novel method using a combination of microcontact printing(muCP) technique, surface-directed condensation and surface-directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into. the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.
收录类别	SCI
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25860
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Lu G.,Cao Z. L.,Lu Z. W.,et al. Fabrication of patterned polymer resists for ion etching by using dewetting[J]. Chemical Journal of Chinese Universities-Chinese,2002,23(12):2390-2392.
APA	Lu G..,Cao Z. L..,Lu Z. W..,Li W..,Yao J. M..,...&Shen J. C..(2002).Fabrication of patterned polymer resists for ion etching by using dewetting.Chemical Journal of Chinese Universities-Chinese,23(12),2390-2392.
MLA	Lu G.,et al."Fabrication of patterned polymer resists for ion etching by using dewetting".Chemical Journal of Chinese Universities-Chinese 23.12(2002):2390-2392.

条目包含的文件		下载所有文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
利用去湿现象制备图案化的离子刻蚀聚合物保（93KB）			开放获取	--	浏览下载