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Study on growth and optical properties of ZnO thin films on Si(111) substrate by plasma assisted molecular beam epitaxy (P-MBE)
其他题名论文其他题名
Yan J. F.; Liang H. W.; Lu Y. M.; Liu Y. C.; Li B. H.; Shen D. Z.; Zhang J. Y.; Fan X. W.
2004
发表期刊Journal of Infrared and Millimeter Waves
ISSN1001-9014
卷号23期号:2页码:103-106
摘要Plasma assisted molecular beam epitaxy was employed to prepare ZnO thin films on Si (111) substrate. In order to look for the optimal substrate temperature for growth of ZnO thin films, the dependence of the quality of ZnO thin films on substrate temperature ranging from 350degreesC to 750degreesC was studied by X-ray diffraction (XRD) and photoluminescence (PL) spectra analysis. The full width at half maximum (FWHM) of XRD and PL spectra become narrower and then wider, a preferred oriented ZnO thin film on Si substrate was obtained at 550 degreesC. The PL spectra show a strong ultraviolet(UV) band emission with a weak deep-level emission. The origin of the UV band is from free excition recombination, testified by the temperature dependent PL spectra in the rang of 81 K similar to 300K.
收录类别SCI
语种中文
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/25792
专题中科院长春光机所知识产出
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Yan J. F.,Liang H. W.,Lu Y. M.,et al. Study on growth and optical properties of ZnO thin films on Si(111) substrate by plasma assisted molecular beam epitaxy (P-MBE)[J]. Journal of Infrared and Millimeter Waves,2004,23(2):103-106.
APA Yan J. F..,Liang H. W..,Lu Y. M..,Liu Y. C..,Li B. H..,...&Fan X. W..(2004).Study on growth and optical properties of ZnO thin films on Si(111) substrate by plasma assisted molecular beam epitaxy (P-MBE).Journal of Infrared and Millimeter Waves,23(2),103-106.
MLA Yan J. F.,et al."Study on growth and optical properties of ZnO thin films on Si(111) substrate by plasma assisted molecular beam epitaxy (P-MBE)".Journal of Infrared and Millimeter Waves 23.2(2004):103-106.
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