Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source

	Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source
其他题名	论文其他题名
	Gong Y.; Chen B.; Ni Q. L.; Cui M. Q.; Zhao Y. D.; Wu Z. H.
	2005
发表期刊	High Energy Physics and Nuclear Physics-Chinese Edition
ISSN	0254-3052
卷号	29 期号:11 页码:1104-1106
摘要	The grazing exit X-ray fluorescence provides a possibility to analyze the characteristics of thin film and, multilayer, especially the thickness, interface structure and composition. The Cr film samples with different thickness deposited on silicon (Si) bases are tested with grazing method using Beijing synchrotron radiation source (SR) as excitation light. The results agree with the theoretical prediction, and the interference of emitted X-ray has been observed.
收录类别	SCI
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25757
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Gong Y.,Chen B.,Ni Q. L.,et al. Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source[J]. High Energy Physics and Nuclear Physics-Chinese Edition,2005,29(11):1104-1106.
APA	Gong Y.,Chen B.,Ni Q. L.,Cui M. Q.,Zhao Y. D.,&Wu Z. H..(2005).Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source.High Energy Physics and Nuclear Physics-Chinese Edition,29(11),1104-1106.
MLA	Gong Y.,et al."Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source".High Energy Physics and Nuclear Physics-Chinese Edition 29.11(2005):1104-1106.

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