Ultraviolet photodetector fabricated from atomic-layer-deposited ZnO films

	Ultraviolet photodetector fabricated from atomic-layer-deposited ZnO films
其他题名	论文其他题名
	Shan C. X.; Zhang J. Y.; Yao B.; Shen D. Z.; Fan X. W.; Choy K. L.
	2009
发表期刊	Journal of Vacuum Science & Technology B
ISSN	1071-1023
卷号	27 期号:3 页码:1765-1768
摘要	Zinc oxide (ZnO) films have been prepared on glass substrate in layer-by-layer mode using an atomic-layer deposition (ALD) technique, and a metal-semiconductor-metal structured photodetector has been fabricated on the ZnO films employing interdigital Au as metal contacts. The photodetector shows a cutoff wavelength at around 390 nm and has an obvious responsivity in the whole UVA spectral range. Because the response of the ZnO photodetector covers the whole UV solar irradiation that can reach the earth, the photodetector promises to be useful in monitoring UV solar irradiation to protect people from harm caused by the solar irradiation. Furthermore, the capability of preparing large-area uniform ZnO films of ALD makes it favorable for possible mass production of this kind of photodetector.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25668
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Shan C. X.,Zhang J. Y.,Yao B.,et al. Ultraviolet photodetector fabricated from atomic-layer-deposited ZnO films[J]. Journal of Vacuum Science & Technology B,2009,27(3):1765-1768.
APA	Shan C. X.,Zhang J. Y.,Yao B.,Shen D. Z.,Fan X. W.,&Choy K. L..(2009).Ultraviolet photodetector fabricated from atomic-layer-deposited ZnO films.Journal of Vacuum Science & Technology B,27(3),1765-1768.
MLA	Shan C. X.,et al."Ultraviolet photodetector fabricated from atomic-layer-deposited ZnO films".Journal of Vacuum Science & Technology B 27.3(2009):1765-1768.

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