Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Theoretical Analysis and Experimental Measurement for Secondary Electron Yield of Microchannel Plate in Extreme Ultraviolet Region | |
其他题名 | 论文其他题名 |
Li M.; Ni Q. L.; Dong N. N.; Chen B. | |
2010 | |
发表期刊 | Spectroscopy and Spectral Analysis |
ISSN | 1000-0593 |
卷号 | 30期号:8页码:2030-2034 |
摘要 | Photon counting detectors based on microchannel plate have widespread applications in astronomy. The present paper deeply studies secondary electron of microchannel plate in extreme ultraviolet. A theoretical model describing extreme ultraviolet-excited secondary electron yield is presented, and the factor affecting on the secondary electron yields of both electrode and lead glass which consist of microchannel plate is analyzed according to theoretical formula derived from the model. The result shows that the higher secondary electron yield is obtained under appropriate condition that the thickness of material is more than 20 nm and the grazing incidence angle is larger than the critical angle. Except for several wavelengths, the secondary electron yields of both electrode and lead glass decrease along with the increase in the wavelength. And also the quantum efficiency of microchannel plate is measured using quantum efficiency test set-up with laser-produced plasmas source as an extreme ultraviolet radiation source, and the result of experiment agrees with theoretical analysis. |
收录类别 | SCI |
语种 | 中文 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/25613 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Li M.,Ni Q. L.,Dong N. N.,et al. Theoretical Analysis and Experimental Measurement for Secondary Electron Yield of Microchannel Plate in Extreme Ultraviolet Region[J]. Spectroscopy and Spectral Analysis,2010,30(8):2030-2034. |
APA | Li M.,Ni Q. L.,Dong N. N.,&Chen B..(2010).Theoretical Analysis and Experimental Measurement for Secondary Electron Yield of Microchannel Plate in Extreme Ultraviolet Region.Spectroscopy and Spectral Analysis,30(8),2030-2034. |
MLA | Li M.,et al."Theoretical Analysis and Experimental Measurement for Secondary Electron Yield of Microchannel Plate in Extreme Ultraviolet Region".Spectroscopy and Spectral Analysis 30.8(2010):2030-2034. |
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