Development of Soft X-Ray Multilayer Mirror at 23. 4 nm

	Development of Soft X-Ray Multilayer Mirror at 23. 4 nm
其他题名	论文其他题名
	Liu Z.; Li X.; Ma Y. Y.; Chen B.; Cao J. L.
	2011
发表期刊	Spectroscopy and Spectral Analysis
ISSN	1000-0593
卷号	31 期号:4 页码:1138-1141
摘要	To meet the research requirement of Ne-like Ge X-ray laser, we designed and fabricated soft X-ray multilayer mirrors at 23. 4 nm. New material combination Ti/Si has been chosen based on the material selecting rule, considering the optical characteristics and physicochemical characteristics. Then the period thickness (d), material ratio (Gamma), and period number (N) of the multilayer were optimized and the reflectivity was calculated by software. The coating parameters were optimized through experiments and the Ti/Si multilayer mirrors at 23. 4 rim were fabricated by magnetron sputtering coating machine. The mirrors were tested by X-ray diffractometer and soft X-ray reflectometer after fabrication. The test results of the Ti/Si multilayer were lambda(0) =23. 2 nm and R=25. 8%. Compared with Mo/Si multiplayer, which is generally used in soft X-ray region, the reflectivity of Ti/Si multilayer increases 10% approximately, and FWHM narrows by 1. 8 nm at 23. 4 nm, indicating better optical performance.
收录类别	SCI
语种	中文
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25564
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Liu Z.,Li X.,Ma Y. Y.,et al. Development of Soft X-Ray Multilayer Mirror at 23. 4 nm[J]. Spectroscopy and Spectral Analysis,2011,31(4):1138-1141.
APA	Liu Z.,Li X.,Ma Y. Y.,Chen B.,&Cao J. L..(2011).Development of Soft X-Ray Multilayer Mirror at 23. 4 nm.Spectroscopy and Spectral Analysis,31(4),1138-1141.
MLA	Liu Z.,et al."Development of Soft X-Ray Multilayer Mirror at 23. 4 nm".Spectroscopy and Spectral Analysis 31.4(2011):1138-1141.

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