Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics

	Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics
其他题名	论文其他题名
	Le Z. C.; Cao J. L.; Liang J. Q.; Pei S.; Yao J. S.; Cui C. J.
	1998
发表期刊	Chinese Physics Letters
ISSN	0256-307X
卷号	15 期号:7 页码:522-524
摘要	The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation. Mo/Si multilayers were annealed at temperature ranging from 360 to 770 K, treated with acetone and 5 parts per thousand NaOH solution, and characterized by small-angle x-ray diffraction technique as well as x-ray photoelectron spectroscopy, and Olympus microscopy.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25333
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Le Z. C.,Cao J. L.,Liang J. Q.,et al. Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics[J]. Chinese Physics Letters,1998,15(7):522-524.
APA	Le Z. C.,Cao J. L.,Liang J. Q.,Pei S.,Yao J. S.,&Cui C. J..(1998).Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics.Chinese Physics Letters,15(7),522-524.
MLA	Le Z. C.,et al."Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics".Chinese Physics Letters 15.7(1998):522-524.