Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics | |
其他题名 | 论文其他题名 |
Le Z. C.; Cao J. L.; Liang J. Q.; Pei S.; Yao J. S.; Cui C. J. | |
1998 | |
发表期刊 | Chinese Physics Letters
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ISSN | 0256-307X |
卷号 | 15期号:7页码:522-524 |
摘要 | The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation. Mo/Si multilayers were annealed at temperature ranging from 360 to 770 K, treated with acetone and 5 parts per thousand NaOH solution, and characterized by small-angle x-ray diffraction technique as well as x-ray photoelectron spectroscopy, and Olympus microscopy. |
收录类别 | SCI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/25333 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Le Z. C.,Cao J. L.,Liang J. Q.,et al. Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics[J]. Chinese Physics Letters,1998,15(7):522-524. |
APA | Le Z. C.,Cao J. L.,Liang J. Q.,Pei S.,Yao J. S.,&Cui C. J..(1998).Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics.Chinese Physics Letters,15(7),522-524. |
MLA | Le Z. C.,et al."Stability of Mo/Si multilayer structure used in Bragg-Fresnel optics".Chinese Physics Letters 15.7(1998):522-524. |
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