Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film

	Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film
其他题名	论文其他题名
	Liu H. W.; Gao C. X.; Wang H.; Cui Q. L.; Zou G. T.; Huang X. M.
	1999
发表期刊	Chinese Physics Letters
ISSN	0256-307X
卷号	16 期号:11 页码:838-840
摘要	Ta/anodized Ta2O5/Al is used as metal-insulator-metal (MIM) clement in experiments. The current-voltage (I-V) characteristic of the MIM element depends on the chamber pressure in I,cat-treating anodized Tn(2)O(5) him. Good nonlinear I-V characteristic has been obtained in the pressure range from 10(-2) to 10(-4) Torr. Meanwhile, the conductivity coefficient alpha of the Poole-Frenkel (PF) equation which describes the I-V characteristic can be regulated by about two orders of magnitude in this pressure range, while the non-linearity coefficient beta of the PF equation is not affected by the chamber pressure.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25304
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Liu H. W.,Gao C. X.,Wang H.,et al. Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film[J]. Chinese Physics Letters,1999,16(11):838-840.
APA	Liu H. W.,Gao C. X.,Wang H.,Cui Q. L.,Zou G. T.,&Huang X. M..(1999).Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film.Chinese Physics Letters,16(11),838-840.
MLA	Liu H. W.,et al."Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film".Chinese Physics Letters 16.11(1999):838-840.

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