Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film | |
其他题名 | 论文其他题名 |
Liu H. W.; Gao C. X.; Wang H.; Cui Q. L.; Zou G. T.; Huang X. M. | |
1999 | |
发表期刊 | Chinese Physics Letters
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ISSN | 0256-307X |
卷号 | 16期号:11页码:838-840 |
摘要 | Ta/anodized Ta2O5/Al is used as metal-insulator-metal (MIM) clement in experiments. The current-voltage (I-V) characteristic of the MIM element depends on the chamber pressure in I,cat-treating anodized Tn(2)O(5) him. Good nonlinear I-V characteristic has been obtained in the pressure range from 10(-2) to 10(-4) Torr. Meanwhile, the conductivity coefficient alpha of the Poole-Frenkel (PF) equation which describes the I-V characteristic can be regulated by about two orders of magnitude in this pressure range, while the non-linearity coefficient beta of the PF equation is not affected by the chamber pressure. |
收录类别 | SCI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/25304 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Liu H. W.,Gao C. X.,Wang H.,et al. Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film[J]. Chinese Physics Letters,1999,16(11):838-840. |
APA | Liu H. W.,Gao C. X.,Wang H.,Cui Q. L.,Zou G. T.,&Huang X. M..(1999).Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film.Chinese Physics Letters,16(11),838-840. |
MLA | Liu H. W.,et al."Effects of chamber pressure on current-voltage characteristic of metal-insulator-metal element in heat-treating anodized Ta2O5 film".Chinese Physics Letters 16.11(1999):838-840. |
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