Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

	Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method
其他题名	论文其他题名
	Gu C. Z.; Jin Z. S.; Wang Y. G.; Jin W. C.; Ji H.; Yuan G.; Wang W. B.
	2000
发表期刊	Diamond and Related Materials
ISSN	0925-9635
卷号	9 期号:9—10 页码:1604-1607
摘要	Diamond films with different crystal structures, morphologies and surface characteristics were synthesized under various deposition parameters and annealing conditions by the microwave plasma chemical vapor deposition (MWPCVD) method using gas mixtures of CH4, CO and H-2. The effects of CH4 concentrations, grain sizes, grain orientations, film thicknesses and annealing technologies in various ambient gases on planar electron emission of diamond films were studied. The results show that small-grained and (011)-oriented diamond films deposited under the condition of high CH4 concentration present the properties of high emission current and low threshold voltage; the emission current increases with decreasing the film thickness. There are largest current density and lowest threshold voltage at the film thickness of 1.5 mu m. The annealing in H-2 after deposition appears to be more beneficial in lowering the threshold voltage, increasing emission current and improving stability for electron emission of films than annealing in N-2 or Ar. These results indicate that diamond thin films with high emission current, low threshold voltage and high stability can be obtained by selecting suitable deposition parameters of diamond films. (C) 2000 Elsevier Science S.A. All rights reserved.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25279
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Gu C. Z.,Jin Z. S.,Wang Y. G.,et al. Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method[J]. Diamond and Related Materials,2000,9(9—10):1604-1607.
APA	Gu C. Z..,Jin Z. S..,Wang Y. G..,Jin W. C..,Ji H..,...&Wang W. B..(2000).Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method.Diamond and Related Materials,9(9—10),1604-1607.
MLA	Gu C. Z.,et al."Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method".Diamond and Related Materials 9.9—10(2000):1604-1607.

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