Field emission from amorphous carbon nitride films deposited on silicon tip arrays

	Field emission from amorphous carbon nitride films deposited on silicon tip arrays
其他题名	论文其他题名
	Li J. J.; Zheng W. T.; Sun L.; Bian H. J.; Jin Z. S.; Zhao H. F.; Song H.; Meng S. H.; He X. D.; Han J. C.
	2003
发表期刊	Chinese Physics Letters
ISSN	0256-307X
卷号	20 期号:6 页码:944-946
摘要	Amorphous carbon nitride films (a-CNx) were deposited on silicon tip arrays by rf magnetron sputtering in pure nitrogen atmosphere. The field emission property of carbon nitride films on Si tips was compared with that of carbon nitride on silicon wafer. The results show that field emission property of carbon nitride films deposited on silicon tips can be improved significantly in contrast with that on wafer. It can be explained that field emission is sensitive to the local curvature and geometry, thus silicon tips can effectively promote field emission property of a-CNx Elms. In addition, the Elms deposited on silicon tips have a smaller effective work function (F = 0.024 eV) of electron field emission than that on silicon wafer (F = 0.060 eV), which indicates a significant enhancement of the ability of electron field emission from a-CNx films.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25158
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Li J. J.,Zheng W. T.,Sun L.,et al. Field emission from amorphous carbon nitride films deposited on silicon tip arrays[J]. Chinese Physics Letters,2003,20(6):944-946.
APA	Li J. J..,Zheng W. T..,Sun L..,Bian H. J..,Jin Z. S..,...&Han J. C..(2003).Field emission from amorphous carbon nitride films deposited on silicon tip arrays.Chinese Physics Letters,20(6),944-946.
MLA	Li J. J.,et al."Field emission from amorphous carbon nitride films deposited on silicon tip arrays".Chinese Physics Letters 20.6(2003):944-946.

条目包含的文件
文件名称/大小	文献类型	版本类型	开放类型	使用许可
Li-2003-Field emissi（218KB）			开放获取	--	浏览下载