Changchun Institute of Optics,Fine Mechanics and Physics,CAS
Field emission from amorphous carbon nitride films deposited on silicon tip arrays | |
其他题名 | 论文其他题名 |
Li J. J.; Zheng W. T.; Sun L.![]() ![]() | |
2003 | |
发表期刊 | Chinese Physics Letters
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ISSN | 0256-307X |
卷号 | 20期号:6页码:944-946 |
摘要 | Amorphous carbon nitride films (a-CNx) were deposited on silicon tip arrays by rf magnetron sputtering in pure nitrogen atmosphere. The field emission property of carbon nitride films on Si tips was compared with that of carbon nitride on silicon wafer. The results show that field emission property of carbon nitride films deposited on silicon tips can be improved significantly in contrast with that on wafer. It can be explained that field emission is sensitive to the local curvature and geometry, thus silicon tips can effectively promote field emission property of a-CNx Elms. In addition, the Elms deposited on silicon tips have a smaller effective work function (F = 0.024 eV) of electron field emission than that on silicon wafer (F = 0.060 eV), which indicates a significant enhancement of the ability of electron field emission from a-CNx films. |
收录类别 | SCI |
语种 | 英语 |
文献类型 | 期刊论文 |
条目标识符 | http://ir.ciomp.ac.cn/handle/181722/25158 |
专题 | 中科院长春光机所知识产出 |
推荐引用方式 GB/T 7714 | Li J. J.,Zheng W. T.,Sun L.,et al. Field emission from amorphous carbon nitride films deposited on silicon tip arrays[J]. Chinese Physics Letters,2003,20(6):944-946. |
APA | Li J. J..,Zheng W. T..,Sun L..,Bian H. J..,Jin Z. S..,...&Han J. C..(2003).Field emission from amorphous carbon nitride films deposited on silicon tip arrays.Chinese Physics Letters,20(6),944-946. |
MLA | Li J. J.,et al."Field emission from amorphous carbon nitride films deposited on silicon tip arrays".Chinese Physics Letters 20.6(2003):944-946. |
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