Structural and electrical properties of amorphous hydrogen carbon-nitrogen films

	Structural and electrical properties of amorphous hydrogen carbon-nitrogen films
其他题名	论文其他题名
	Suo D. C.; Liu Y. C.; Liu Y.; Qi X. Y.; Zhong D. Q.
	2004
发表期刊	Chinese Physics Letters
ISSN	0256-307X
卷号	21 期号:2 页码:400-402
摘要	Amorphous hydrogenated carbon-nitrogen (a-C:H:(N)) films with different nitrogen contents have been deposited by using rf-sputtering of a high purity graphite target in an Ar-H-2 N-2 atmosphere. Transmittance and reflectance spectra are used to characterize the Tauc gap and absorption coefficients in the wavelength range 0.185-3.2 mum. The temperature dependence of conductivity demonstrates a hopping mechanism of the Fermi level in the temperature range of 77-300 K. The density of state at the Fermi level is derived from the direct current conductivity. The photoluminescence properties of a-C:H:N films were investigated. The photoluminescence peak has a blue shift with increasing excitation energy. These results are discussed on the basis of a model in which the different sp(2) clusters dispersed in sp(3) matrices.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/25099
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Suo D. C.,Liu Y. C.,Liu Y.,et al. Structural and electrical properties of amorphous hydrogen carbon-nitrogen films[J]. Chinese Physics Letters,2004,21(2):400-402.
APA	Suo D. C.,Liu Y. C.,Liu Y.,Qi X. Y.,&Zhong D. Q..(2004).Structural and electrical properties of amorphous hydrogen carbon-nitrogen films.Chinese Physics Letters,21(2),400-402.
MLA	Suo D. C.,et al."Structural and electrical properties of amorphous hydrogen carbon-nitrogen films".Chinese Physics Letters 21.2(2004):400-402.

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