Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering

	Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering
其他题名	论文其他题名
	Jing S. W.; Liu Y. C.; Liang Y.; Ma J. G.; Lu Y. M.; Shen D. Z.; Zhang J. Y.; Fan X. W.; Mu R. X.
	2006
发表期刊	Chinese Physics Letters
ISSN	0256-307X
卷号	23 期号:3 页码:682-685
摘要	TiO2-xNx thin films are deposited onto Si(100) and quartz substrates by a rf magnetron sputtering method using a titanium metal disc as a target in Ar, N-2, and O-2 atmospheres. The substrate temperature is kept at 300 degrees C. The O-2 and Ar gas flow rates are kept to be constants and the N gas flow rate is varied. TiO2-xNx films with different N contents are characterized by x-ray diffraction and x-ray photoelectron spectroscopy The results indicate that the TiO2-xNx thin films can be obtained at 13% N and 15% N contents in the film, and the films with mixed TiO2 and TiN crystal can be obtained at 13% N and 15% N contents in the film. In terms of the results of x-ray photoelectron spectroscopy, N 1s of beta-N (396eV) is the main component in the TiO2-xNx thin films. Because the energy level of O-N is positioned above the valence-band maximum of TiO2, an effective optical-energy gap decreases from 2.8 eV (for pure TiO2 film deposited by the same rf sputtering system) to 2.3 eV, which is verified by the optical-absorption spectra.
收录类别	SCI
语种	英语
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/24929
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Jing S. W.,Liu Y. C.,Liang Y.,et al. Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering[J]. Chinese Physics Letters,2006,23(3):682-685.
APA	Jing S. W..,Liu Y. C..,Liang Y..,Ma J. G..,Lu Y. M..,...&Mu R. X..(2006).Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering.Chinese Physics Letters,23(3),682-685.
MLA	Jing S. W.,et al."Compositional and structural properties of TiO2-xNx thin films deposited by radio-frequency magnetron sputtering".Chinese Physics Letters 23.3(2006):682-685.

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