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Defects and Microstructures in the Surface Layer of Single-crystal Silicon Induced by High-current Pulsed Electron Beam
其他题名论文其他题名
Wang X. T.; Guan Q. F.; Gu Q. Q.; Peng D. J.; Li Y.; Chen B.
2010
发表期刊Journal of Inorganic Materials
ISSN1000-324X
卷号25期号:12页码:1313-1317
摘要In order to investigate the microstructures of nonmetallic material induced by high-speed deformation, the high-current pulsed electron beam (HCPEB) technique was used to irradiate the single-crystal silicon. The surface microstructures induced by electron beam were studied by transmission electron microscope (TEM). The experimental results showed that a large number of defect structures were formed by the HCPEB irradiation. Among them, the typical defect structures were the parallel screw dislocations and the extrinsic stacking faults. In the meantime, the HCPEB irradiation induced high density of vacancy cluster defects. The surface stress with very high value and strain rate led to the integral shift of (111) crystal plane, which might be the dominating reason of the formation of the massive vacancy cluster defects. In addition, the mixtures of nanocrystal and amorphous in the surface of single-crystal silicon can be formed by HCPEB technique.
收录类别SCI
语种中文
文献类型期刊论文
条目标识符http://ir.ciomp.ac.cn/handle/181722/24743
专题中科院长春光机所知识产出
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GB/T 7714
Wang X. T.,Guan Q. F.,Gu Q. Q.,et al. Defects and Microstructures in the Surface Layer of Single-crystal Silicon Induced by High-current Pulsed Electron Beam[J]. Journal of Inorganic Materials,2010,25(12):1313-1317.
APA Wang X. T.,Guan Q. F.,Gu Q. Q.,Peng D. J.,Li Y.,&Chen B..(2010).Defects and Microstructures in the Surface Layer of Single-crystal Silicon Induced by High-current Pulsed Electron Beam.Journal of Inorganic Materials,25(12),1313-1317.
MLA Wang X. T.,et al."Defects and Microstructures in the Surface Layer of Single-crystal Silicon Induced by High-current Pulsed Electron Beam".Journal of Inorganic Materials 25.12(2010):1313-1317.
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