Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting

	Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting
其他题名	论文其他题名
	Li W.H.; Bayanheshig; Qi X.D.; Tang Y.G.
	2008
发表期刊	Optoelectronics Letters
ISSN	16731905
卷号	4 期号:3 页码:177-179
摘要	A novel technology to manufacture holographic ion beam etched diffraction gratings based on surface thermokinematics is presented. The surface roughness of photoresist gratings is solved by this technology. According to this technology, a holographic ion beam etched blazed grating of 1200 l/mm for use in the ultraviolet region is manufactured. The experimental results show that the grating has good surface quality, low stray light and high diffraction efficiency. In addition, the performance of thes gratings satisfies the operating requirements of ultraviolet spectrograph. 2008 Tianjin University of Technology and Springer-Verlag GmbH.
收录类别	EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/24494
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Li W.H.,Bayanheshig,Qi X.D.,et al. Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting[J]. Optoelectronics Letters,2008,4(3):177-179.
APA	Li W.H.,Bayanheshig,Qi X.D.,&Tang Y.G..(2008).Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting.Optoelectronics Letters,4(3),177-179.
MLA	Li W.H.,et al."Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting".Optoelectronics Letters 4.3(2008):177-179.

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