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Design rule and orientation layout for MEMS curved beams on silicon
Alternative Title论文其他题名
Chen T.M.; Liu Z.; Korvink J. G.; Wallrabe U.
2010
Source PublicationJournal of Microelectromechanical Systems
ISSN10577157
Volume19Issue:3Pages:706-714
AbstractAn analysis method used to choose a suitable structural orientation layout for a microcompliant mechanism, which includes multi-curved-beams, is introduced, particularly, for fabricating microelectromechanical-systems (MEMS) thin-curved-beam microstructures on (100) and (111) single-crystal silicon (SCS) wafers. The achievement of a large deflection of a fabricated SCS device verifies the usability of this design rule. The orientation layouts of the device for a large deflection are restricted to a specific region. Based on the analysis method, it is better to follow a 21 safe region between the (100) and (110) orientations in order to decrease the possibility of crystal slip failure. Using this design consideration, one can design more robust MEMS compliant mechanisms from SCS, exploiting its ideal elasticity. 2010 IEEE.
Indexed ByEI
Document Type期刊论文
Identifierhttp://ir.ciomp.ac.cn/handle/181722/24458
Collection中科院长春光机所知识产出
Recommended Citation
GB/T 7714
Chen T.M.,Liu Z.,Korvink J. G.,et al. Design rule and orientation layout for MEMS curved beams on silicon[J]. Journal of Microelectromechanical Systems,2010,19(3):706-714.
APA Chen T.M.,Liu Z.,Korvink J. G.,&Wallrabe U..(2010).Design rule and orientation layout for MEMS curved beams on silicon.Journal of Microelectromechanical Systems,19(3),706-714.
MLA Chen T.M.,et al."Design rule and orientation layout for MEMS curved beams on silicon".Journal of Microelectromechanical Systems 19.3(2010):706-714.
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