Design rule and orientation layout for MEMS curved beams on silicon

	Design rule and orientation layout for MEMS curved beams on silicon
其他题名	论文其他题名
	Chen T.M.; Liu Z.; Korvink J. G.; Wallrabe U.
	2010
发表期刊	Journal of Microelectromechanical Systems
ISSN	10577157
卷号	19 期号:3 页码:706-714
摘要	An analysis method used to choose a suitable structural orientation layout for a microcompliant mechanism, which includes multi-curved-beams, is introduced, particularly, for fabricating microelectromechanical-systems (MEMS) thin-curved-beam microstructures on (100) and (111) single-crystal silicon (SCS) wafers. The achievement of a large deflection of a fabricated SCS device verifies the usability of this design rule. The orientation layouts of the device for a large deflection are restricted to a specific region. Based on the analysis method, it is better to follow a 21 safe region between the (100) and (110) orientations in order to decrease the possibility of crystal slip failure. Using this design consideration, one can design more robust MEMS compliant mechanisms from SCS, exploiting its ideal elasticity. 2010 IEEE.
收录类别	EI
文献类型	期刊论文
条目标识符	http://ir.ciomp.ac.cn/handle/181722/24458
专题	中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Chen T.M.,Liu Z.,Korvink J. G.,et al. Design rule and orientation layout for MEMS curved beams on silicon[J]. Journal of Microelectromechanical Systems,2010,19(3):706-714.
APA	Chen T.M.,Liu Z.,Korvink J. G.,&Wallrabe U..(2010).Design rule and orientation layout for MEMS curved beams on silicon.Journal of Microelectromechanical Systems,19(3),706-714.
MLA	Chen T.M.,et al."Design rule and orientation layout for MEMS curved beams on silicon".Journal of Microelectromechanical Systems 19.3(2010):706-714.

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